Hot-wire CVD amorphous Si materials for solar cell application

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3570-3574

  Wang, Qi ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

a Si:H; HWCVD; Solar cell; Thin film

Indexed keywords

A-SI:H; AMORPHOUS SI; CELL RESEARCHES; DEPOSITION TECHNIQUES; FILM PROPERTIES; HOT-WIRE CHEMICAL VAPOR DEPOSITIONS; HOT-WIRE CVD; HWCVD; HYDROGENATED AMORPHOUS SILICONS (ASI:H); MASS PRODUCTIONS; SOLAR CELL PERFORMANCE; SOLAR-CELL APPLICATIONS;

AMORPHOUS FILMS; AMORPHOUS SILICON; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS; THIN FILM DEVICES; THIN FILMS; WIRE;

CHEMICAL VAPOR DEPOSITION;

EID: 64349084694     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.072     Document Type: Article

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