Ion-assisted deposition of TiO2/SiO2 multilayers for mass production

Applied Optics

Volumn 45, Issue 7, 2006, Pages 1461-1464

  Fan, Bin ^a   Suzuki, Masahiro ^a   Tang, Ken ^a  

^a Optorun Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; LIGHT ABSORPTION; MICROSTRUCTURE; OPTICAL PROPERTIES; SILICA; TITANIUM DIOXIDE;

ION-ASSISTED-DEPOSITION (IAD) PARAMETERS; MASS PRODUCTION; MICROSTRUCTURAL PROPERTIES;

MULTILAYERS;

EID: 33645285566     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.001461     Document Type: Article

References (8)

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