Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films

Journal of Applied Physics

Volumn 102, Issue 6, 2007, Pages

  Yao, Jianke ^a   Fan, Zhengxiu ^a   Jin, Yunxia ^a   Zhao, Yuanan ^a   He, Hongbo ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; LASER DAMAGE; PARTIAL PRESSURE; STOICHIOMETRY; THRESHOLD VOLTAGE; TITANIUM DIOXIDE;

ELECTRON BEAM EVAPORATION; LASER-INDUCED DAMAGE THRESHOLD (LIDT); NONSTOICHIOMETRIC DEFECTS; PACKING DENSITY;

THIN FILMS;

EID: 34848837624     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2779243     Document Type: Article

References (12)

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