Effect of bottom electrode on dielectric property of sputtered- (Ba,Sr) TiO3 films

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Ito, Shinichi ^a   Yamada, Tomoaki ^a   Takahashi, Kenji ^a   Okamoto, Shoji ^a   Kamo, Takafumi ^a   Funakubo, Hiroshi ^a   Koutsaroff, Ivoyl ^b,c   Zelner, Marina ^b   Cervin Lawry, Andrew ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Gennum Corporation   (Canada)

^c MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM ELECTRODES; BST FILMS; DEPOSITION TEMPERATURES; DIELECTRIC CONSTANTS; HIGHER TEMPERATURES; IN-BETWEEN; PT ELECTRODES; R F SPUTTERING; THIN LAYERS; TUNABILITY;

BARIUM; CERAMIC CAPACITORS; DIELECTRIC LOSSES; DIELECTRIC WAVEGUIDES; ELECTRODEPOSITION; PERMITTIVITY; PLATINUM; SILICON COMPOUNDS; SUBSTRATES;

FILM GROWTH;

EID: 63749121581     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3058998     Document Type: Article

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