Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/ C2 H2

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Ariskin, D A ^a,b   Schweigert, I V ^a,b   Alexandrov, A L ^a   Bogaerts, A ^b   Peeters, F M ^b  

^a KHRISTIANOVICH INSTITUTE OF THEORETICAL AND APPLIED MECHANICS   (Russian Federation)

^b UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROCESS; DISCHARGE VOLUMES; ELECTRON MOTIONS; HEAVY HYDROCARBONS; HYBRID MODELS; ION TRANSPORTS; KINETIC DESCRIPTIONS; LOW PRESSURES; PLASMA PARAMETERS; PLASMOCHEMICAL PROCESS; PLASMOCHEMISTRY; POSITIVELY CHARGED; RADIO FREQUENCY DISCHARGES;

ACETYLENE; ARGON; CHEMICAL BONDS; CHEMICAL ENGINEERING; ELECTRONEGATIVITY; LIGHTING; ORGANIC COMPOUNDS;

MIXTURES;

EID: 63749094724     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3095760     Document Type: Article

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