Atomic force microscopy indentation of fluorocarbon thin films fabricated by plasma enhanced chemical deposition at low radio frequency power

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3310-3314

  Sirghi, L ^a   Ruiz, A ^a   Colpo, P ^a   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

Author keywords

Elastic properties; Fluorocarbon; Nanoindentation; Plasticity index

Indexed keywords

ELASTICITY; ELECTRIC DISCHARGES; HARDNESS; MECHANICAL PROPERTIES; NANOINDENTATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PLASTICITY; POLYMER BLENDS; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

AFM; AFM PROBES; ATOMIC FORCES; ATOMIC-FORCE MICROSCOPIES; BIAS POTENTIALS; CHEMICAL DEPOSITIONS; DEPOSITION METHODS; DEPOSITION OF FILMS; DISCHARGE POWER; ELASTIC PROPERTIES; ELASTICITY MODULUS; FILM HARDNESS; FLUOROCARBON THIN FILMS; FORCE-DEPTH CURVES; HYDROPHOBIC PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS; PLASTICITY INDEX; RADIO FREQUENCY POWER; TIP RADIUS;

ATOMIC FORCE MICROSCOPY;

EID: 63149176712     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.055     Document Type: Article

References (26)

1. VanLandingham M.R., McKnight S.H., Palmese G.R., Elings J.R., Huang X., Bogetti T.A., Eduljee R.F., and Gillespie Jr. J.W. J. Adhes. 64 (1997) 31
2. Reynaud C., Sommer F., Quet C., El Bounia N., and Duc T.M. Surf. Interface Anal. 30 (2000) 185
3. Jung Y.-G., Lawn B.R., Martyniuk M., Huang H., and Hu X.Z. J. Mater. Res. 19 (2004) 3076
4. Xie X.N., Chung H.J., Sow C.H., and Wee A.T.S. Mater. Sci. Eng., R 54 (2006) 1
5. Cappella B., and Bonaccurso E. Nanotechnology 18 (2007) 155307
6. Yang F., Wornyo E., Gall K., and King W.P. Nanotechnology 18 (2007) 285302
7. Karis T.E., Tyndall G.W., Fenzel-Alexander D., and Crowder M.S. J. Vac. Sci. Technol., A 15 (1997) 2382
8. Ji H., Côté A., Koshel D., Terreault B., Abel G., Ducharme P., Ross G., Savoie S., and Gagné M. Thin Solid Films 405 (2002) 104
9. Shirakura A., Nakaya M., Koga Y., Kodama H., Hasebe T., and Suzuki T. Thin Solid Films 494 (2006) 84
10. Hasebe T., Shimada A., Suzuki T., Matsuoka Y., Saito T., Yohena S., Kamijo A., Shiraga N., Higuchi M., Kimura K., Yoshimura H., and Kuribayashi S. J. Biomed. Mater. Res. 76A (2005) 86
11. Bottani C.E., Lamperti A., Nobili L., and Ossi P.M. Thin Solid Films 433 (2003) 149
12. Ayala P., Maia da Costa M.E.H., Prioli R., and Freire Jr. F.L. Surf. Coat. Technol. 182 (2004) 335
13. Tang G., Ma X., Sun M., and Li X. Carbon 43 (2005) 345
14. Koshel D., Ji H., Terreault B., Cote A., Ross G.G., Abel G., and Bolduc M. Surf. Coat. Technol. 173 (2003) 161
15. Milella A., Palumbo F., Favia P., Cicala G., and d'Agostino R. Plasma Process. Polym. 1 (2004) 164
16. Lacroix L.-M., Lejeune M., Ceriotti L., Kormunda M., Meziani T., Colpo P., and Rossi F. Surf. Sci. 592 (2005) 182
17. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
18. Sneddon I.N. Int. J. Eng. Sci. 3 (1965) 47
19. Lejeune M., Lacroix L.-M., Brétagnol F., Valsesia A., Colpo P., and Rossi F. Langmuir 22 (2006) 3057
20. Burnham N.A., Chen X., Hodges C.S., Matei G.A., Thoreson E.J., Roberts C.J., Davies M.C., and Tendler S.J.B. Nanotechnology 14 (2003) 1
21. Markiewicz P., and Cynthia Goh M. Rev. Sci. Instrum. 66 (1995) 3186
22. Sirghi L., Kilian O., Gilliland D., and Ceccone G. J. Phys. Chem., B 110 (2006) 25975
23. Clifford C.A., and Seah M.P. Nanotechnology 17 (2006) 5283
24. Sirghi L., and Rossi F. Appl. Phys. Lett. 89 (2006) 243118
25. Briscoe B.J., Fiori L., and Pelillo E. J. Phys., D, Appl. Phys. 31 (1998) 2395
26. Doerner M.F., and Nix W.D. J. Mater. Res. 1 (1986) 601