Surface morphology and preferential orientation growth of TaC crystals formed by chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3235-3239

  Xiong, Xiang ^a   Chen, Zhao ke ^a   Huang, Bai yun ^a   Li, Guo dong ^a   Zheng, Feng ^a   Xiao, Peng ^a   Zhang, Hong bo ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Chemical vapor deposition (CVD); Coatings; Growth mechanism; Scanning electron microscopy; Surface morphology; X ray diffraction

Indexed keywords

COALESCENCE; CRYSTAL ORIENTATION; CRYSTALS; DEPOSITION; DEPOSITION RATES; DIFFRACTION; ELECTRON MICROSCOPES; GRAPHITE; MORPHOLOGY; SCANNING; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; VAPORS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION TEMPERATURES; DETERIORATION MODELS; FORMATION MECHANISMS; GRAPHITE SHEETS; GROWTH MECHANISM; GROWTH PARAMETERS; PREFERENTIAL GROWTH ORIENTATIONS; PREFERENTIAL ORIENTATIONS; TA-C FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 62849120553     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.058     Document Type: Article

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