Combining convective/capillary deposition and AFM oxidation lithography for close-packed directed assembly of colloids

Langmuir

Volumn 24, Issue 23, 2008, Pages 13254-13257

  Ressier, L ^a   Viallet, B ^a   Beduer, A ^a   Fabre, D ^a   Fabie, L ^a,b   Palleau, E ^a   Dague, E ^b  

^a INSA   (France)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AFM OXIDATIONS; AQUEOUS SUSPENSIONS; ATOMIC FORCES; CAPILLARY FORCES; CLOSE-PACKED ASSEMBLIES; CONVECTIVE FLOWS; DIRECTED ASSEMBLIES; ESCHERICHIA COLI BACTERIA; FUNCTIONALIZED; GENERIC METHODS; HYDROPHOBIC MONOLAYERS; LATEX NANOPARTICLES; OCTADECYLTRIMETHOXYSILANE; SILICON DEVICES; SILICON SUBSTRATES; THREE-STEP MECHANISMS;

COLLOID CHEMISTRY; ESCHERICHIA COLI; OXIDATION; SILANES;

SUSPENSIONS (FLUIDS);

NANOPARTICLE; SILICON DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; COLLOID; ESCHERICHIA COLI; METHODOLOGY; OXIDATION REDUCTION REACTION; SURFACE PROPERTY; SUSPENSION;

COLLOIDS; ESCHERICHIA COLI; MICROSCOPY, ATOMIC FORCE; NANOPARTICLES; OXIDATION-REDUCTION; SILICON COMPOUNDS; SURFACE PROPERTIES; SUSPENSIONS;

EID: 62649104804     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la8028726     Document Type: Article

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