Metrology challenges for double exposure and double patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Arnold, William H ^a   Dusa, Mircea ^a   Finders, Jo ^b  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE PATTERNING; HALF PITCH; HIGH INDEX FLUIDS; IC METROLOGY;

ECONOMICS; GLASS; LITHOGRAPHY; WATER;

PATTERN RECOGNITION;

EID: 35048904536     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.721459     Document Type: Conference Paper

References (13)

1. B.J. Lin, Proc. SPIE, Vol. 633, 44, 1986
2. W.H. Arnold, Nikkei Microdevices, 96-103, April 2006
3. H. Sewell, et al, Proc. SPIE, Vol. 6154, 06, 2006
4. M. Dusa et al, Proc. ISSM, 2005
5. H. Meiling et al, Proc. SPIE, Vol. 6151, 08, 2006
6. YK. Choi et al, IEEE Trans. El. Dev., Vol. 49, No. 3, 436-441, 2002
7. W.H. Arnold, Mircea Dusa, IEEE Lithography Workshop, August 2006
8. H. van der Laan, et al, Proc. SPIE, 5755-13, 2005
9. Luigi Capodieci, Proc. SPIE, 6152-01, 2006
10. W. Jung, Proc. SPIE, 6156-27, 2006
11. M. Burkhardt, et al, Proc. SPIE 6520-97, 2007
12. Ofer Adan, et al, Proc. SPIE 6518-50, 2007
13. M. Dusa, et al, Proc. SPIE 6520-16, 2007