Scattered light: The increasing problem for 193 nm exposure tools and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1424-1435

  Lai, Kafai ^a   Wu, Chung Hsi ^a   Progler, Christopher ^a  

^a IBM RESEARCH   (United States)

Author keywords

Flare; Photolithography; Power spectral density; Scattered light; Spatial frequency; Stray light

Indexed keywords

IMAGE QUALITY; LIGHT SCATTERING; POLYNOMIALS; PROJECTION SYSTEMS; STRAY LIGHT; SURFACE ROUGHNESS;

POWER SPECTRAL DENSITIES (PSD);

PHOTOLITHOGRAPHY;

EID: 0035758507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435712     Document Type: Conference Paper

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