A methodology for double patterning compliant split and design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Wiaux, Vincent ^a   Verhaegen, Staf ^a   Iwamoto, Fumio ^b   Maenhoudt, Mireille ^a   Matsuda, Takashi ^b   Postnikov, Sergei ^c   Vandenberghe, Geert ^a  

^a CMOS Device Research Group   (Belgium)

^b PANASONIC CORPORATION   (Japan)

^c INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Design rules; Double patterning; DRAM; Guidelines; Logic; Metal1; Process variations; Split; Stitching

Indexed keywords

DESIGN RULES; DOUBLE PATTERNING; DRAM; GUIDELINES; LOGIC; METAL1; PROCESS VARIATIONS; SPLIT; STITCHING;

DYNAMIC POSITIONING; DYNAMIC RANDOM ACCESS STORAGE; MASKS; PERCOLATION (SOLID STATE); SENSITIVITY ANALYSIS;

DESIGN;

EID: 62449095113     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804697     Document Type: Conference Paper

References (7)

1. Martin Drapeau et al., "Double Patterning Design Split Implementation and Validation for the 32nm Node", Proc. SPIE Vol. 6521, 692109, Design for Manufacturability through Design-Process Integration I (2007)
2. Kevin Lucas et al., "Interactions of double patterning technology with wafer processing, OPC and design flows", Proc. SPIE Vol. 6924, 692403, Optical Microlithography XXI (2008)
3. Christopher Cork et al., "Checking design conformance and optimizing manufacturability using automated Double Patterning decomposition", Proc. SPIE 6925-62, Design for Manufacturability through Design-Process Integration II (2008)
4. Alex Tritchkov et al., "Double patterning Decomposition, Design Compliance, Verification Algorithms at 45nm hp and 32 nm hp", Proc. SPIE Vol. 7122, 71220S-8, Photomask Technology Conference (2008)
5. George E. Bailey et al., "Double pattern EDA solutions for 32nm HP and beyond", Proc. SPIE 6521-1K, Design for Manufacturability through Design-Process Integration I (2007)
6. Janko Versluijs et al., "30nm half-pitch metal patterning using Motif™ CD shrink technique and double patterning", Proc. SPIE Vol. 6924, 69242C, Optical Microlithography XXI (2008)
7. Mireille Maenhoudt et al., "Alternative process schemes for double patterning that eliminate the intermediate etch step", Proc. SPIE Vol. 6924, 69240P, Optical Microlithography XXI (2008)