Characteristics of Ni films deposited on SiO 2 /Si(1 0 0) and MgO(0 0 1) by direct current magnetron sputtering system with the oblique target

Applied Surface Science

Volumn 255, Issue 12, 2009, Pages 6226-6231

  Yang, Ya ^a   Qiu, Hong ^a   Chen, Xiaobai ^b   Yu, Mingpeng ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

Author keywords

Magnetization; Ni film; Oblique target sputtering; Resistivity; Structure

Indexed keywords

ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; LATTICE CONSTANTS; MAGNESIA; MAGNETIZATION; MAGNETRON SPUTTERING; SATURATION MAGNETIZATION; SILICA; STRUCTURE (COMPOSITION); SUBSTRATES;

COLUMNAR GRAIN STRUCTURE; CRYSTALLINE ORIENTATIONS; DEPOSITION TEMPERATURES; DIRECT CURRENT MAGNETRON SPUTTERING; GRANULAR GRAINS; GROWTH DIRECTIONS; NI FILMS; TARGET SPUTTERING;

FILM GROWTH;

EID: 62349136132     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.01.085     Document Type: Article

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