Comparative study of the characteristics of Ni films deposited on SiO2/Si(100) by oblique-angle sputtering and conventional sputtering

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7903-7909

  Yu, Mingpeng ^a   Qiu, Hong ^a   Chen, Xiaobai ^b   Wu, Ping ^a   Tian, Yue ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY   (China)

Author keywords

Magnetization; Ni film; Oblique angle sputtering; Resistivity; Structural properties

Indexed keywords

NICKEL ALLOYS; SILICON COMPOUNDS;

COMPARATIVE STUDIES; MAGNETIZATION; NI FILM; NI FILMS; OBLIQUE-ANGLE SPUTTERING; RESISTIVITY; STRUCTURAL PROPERTIES;

NICKEL;

EID: 49349093007     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.056     Document Type: Article

References (22)

1. Tait R.N., Smy T., and Brett M.J. J. Vac. Sci. Technol. A10 (1992) 1518
2. van Kranenburg H., and Lodder C. Mater. Sci. Eng. R: Rep. 11 (1994) 295
3. Zhou X.W., and Wadley H.N.G. J. Appl. Phys. 87 (2000) 553
4. Otiti T. J. Mater. Sci. 39 (2004) 477
5. Chen X.B., Qiu H., Qian H., Wu P., Wang F.P., Pan L.Q., and Tian Y. Vacuum 75 (2004) 217
6. Chen X.B., Qiu H., Wu P., Wang F.P., Pan L.Q., and Tian Y. Physica B 362 (2005) 255
7. Chen X.B., Qiu H., Wu P., Wang F.P., Pan L.Q., and Tian Y. Thin Solid Films 515 (2006) 2786
8. Dobson P.J., and Hopkins B.J. Thin Solid Films 5 (1970) 97
9. Jung Y.S. Appl. Surf. Sci. 221 (2004) 281
10. Li X.H., and Yang Z. Mater. Sci. Eng. B106 (2004) 41
11. Qiu H., Wang F.P., Wu P., Pan L.Q., and Tian Y. Vacuum 66 (2002) 447
12. Kuwahara K., and Shinzato S. Thin Solid Films 164 (1988) 165
13. Kinbara A., and Fujiwara H. Thin Films, Syokabo, Tokyo (1991) 250 [in Japanese]
14. Hasegawa K., Nakamura Y., Izumi T., and Shiohara Y. Physica C 378-381 (2002) 955
15. Ma B., Li M., Jee Y.A., Koritara R.E., Fisher B.L., and Balachandran U. Physica C 366 (2002) 270
16. Van der Drift A. Philips Res. Rep. 22 (1967) 267
17. Westwood W.D. J. Vac. Sci. Technol. 15 (1978) 1
18. Zhang J.M., Ma F., and Xu K.W. Appl. Surf. Sci. 229 (2004) 34
19. McKenzie D.R., and Bilek M.M.M. Thin Solid Films 382 (2001) 280
20. Thornton J.A. Ann. Rev. Mater. Sci. 7 (1977) 239
21. Maruyama H., Qiu H., Nakai H., and Hashimoto M. J. Vac. Sci. Technol. A13 (1995) 2157
22. Maruyama H., Qiu H., Nakai H., and Hashimoto M. Thin Solid Films 254 (1995) 224