The influence of ion bombardment intensity during deposition on nickel films microstructure

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 75-80

  Popovic N ^a   Bogdanov, Z ^a   Goncic B ^a   Zec, S ^a   Rakocevic Z ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Deposition; Ion bombardment intensity; Microstructure

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; GLASS; GRAIN SIZE AND SHAPE; ION BEAMS; ION BOMBARDMENT; MORPHOLOGY; NICKEL; NITROGEN; SPUTTER DEPOSITION; TEXTURES;

ION ASSISTED DEPOSITION;

METALLIC FILMS;

EID: 0032626118     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01578-8     Document Type: Article

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