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Volumn 49, Issue 4, 1998, Pages 257-263
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Preferred orientations of evaporated Ni films on Mo and SiO2 substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0002028373
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/s0042-207x(98)00094-3 Document Type: Article |
Times cited : (28)
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References (12)
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