Effect of process parameters and post-deposition annealing on the microwave dielectric and optical properties of pulsed laser deposited Bi 1.5Zn1.0Nb1.5O7 thin films

Applied Physics A: Materials Science and Processing

Volumn 95, Issue 2, 2009, Pages 485-492

  Sudheendran, K ^a   Ghanashyam Krishna, M ^a   Raju, K C James ^a  

^a UNIVERSITY OF HYDERABAD   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BISMUTH; CERAMIC CAPACITORS; DIELECTRIC WAVEGUIDES; ELECTRODEPOSITION; FUSED SILICA; LIGHT REFRACTION; MICROWAVES; NIOBIUM; NIOBIUM COMPOUNDS; OXYGEN; PERMITTIVITY; PULSED LASER DEPOSITION; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; THIN FILMS; ZINC;

ANNEALED FILMS; AS-DEPOSITED FILMS; AS-DEPOSITED THIN FILMS; ATOMIC-FORCE MICROSCOPIES; BISMUTH ZINC NIOBATE; CUBIC PYROCHLORE STRUCTURES; DIELECTRIC CONSTANTS; FUSED SILICA SUBSTRATES; GRAIN MORPHOLOGIES; IN BANDS; MICROWAVE DIELECTRIC CONSTANTS; MICROWAVE DIELECTRICS; OPTICAL ABSORPTION EDGES; OXYGEN PRESSURES; POST-DEPOSITION ANNEALING; PROCESS PARAMETERS; PULSED LASERS; ULTRA-FINE GRAINS;

AMORPHOUS FILMS;

EID: 62349117431     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4924-1     Document Type: Article

References (28)

1. W. Ren S. Trolier-McKinstry C.A. Randall T.R. Shrout 2001 J. Appl. Phys. 89 767
2. H. Wang X. Yao 2001 J. Mater. Res. 16 83
3. A.K. Tagantsev J. Lu S. Stemmer 2005 Appl. Phys. Lett. 86 032901
4. I.D. Kim Y.W. Choi H.L. Tuller 2005 Appl. Phys. Lett. 87 043509
5. J. Park J.W. Lu D.S. Boesch S. Stemmer R.A. York 2006 IEEE Microw. Wirel. Compon. Lett. 16 264
6. M. Ghanashyam Krishna J.S. Pillier A.K. Bhattacharya 1999 Thin Solid Films 357 218
7. A. Hartridge M. Ghanashyam Krishna A.K. Bhattacharya 1998 J. Phys. Chem. Solids 59 845
8. M.A. Rzepecka M.A.K. Hamid 1972 IEEE Trans. Microw. Theory Techn. MTT 20 30
9. X. Wang H. Wang X. Yao 1997 J. Am. Ceram. Soc. 80 2745
10. X. Wang, H. Wang, X. Yao, in Proc. 4th Int. Meeting on Electroceramics, Aachen, Germany, vol. 143 (1994)
11. K. Venkata Saravanan K. Sudheendran K.C. James Raju M. Ghanashyam Krishna A.K. Bhatnagar 2006 Vacuum 81 307
12. K. Sudheendran K.C. James Raju 2008 Ceram. Int. 34 897
13. J. Park J. Lu S. Stemmer R.A. York 2005 J. Appl. Phys. 97 084110
14. R.L. Thayer C.A. Randall S. Trolier-Mckinstry 2003 J. Appl. Phys. 94 1941
15. X. Gong W. Han She E.E. Hoppenjans Z.N. Wing R.G. Geyer J.W. Halloran W.J. Chappell 2005 IEEE Trans. Microw. Theory Techn. 53 3638
16. D. Brassard M.A. Elkhakni 2005 J. Appl. Phys. 98 054912
17. H. Kitahata K. Tadanaga T. Minami N. Fujimura T. Ito 1998 J. Am. Ceram. Soc. 81 1357
18. J. Xu W. Menesklou E.L. Tiffee 2004 J. Eur. Ceram. Soc. 24 1735
19. I.P. Koutsaroff, P. Woo, L. McNeil, M. Zelner, A. Kassam, M. Capanu, L. Chmiel, B. McClelland, A. Cervin-Lawry, in Proceedings of the 13th IEEE International Symposium on Applications of Ferroelectrics, Nara, Japan, p. 247 (2002)
20. T.R. Taylor P.J. Hanse B. Acikel N. Pervez R.A. York S.K. Streiffer J.S. Speck 2002 Appl. Phys. Lett. 80 1978
21. Y.M. Tao Y.Z. Yu 2007 J. Appl. Phys. 101 024111
22. J.W. Lu D.O. Klenov S. Stemmer 2004 Appl. Phys. Lett. 84 957
23. S. Ito K. Takahashi S. Okamoto I.P. Koutsaroff A. Cervin-Lawry H. Funakubo 2005 Jpn. J. Appl. Phys. 44 6881
24. B. Ngayen Y. Liu R.L. Withers 2007 J. Solid State Chem. 180 549
25. Levin T.G. Amos J.C. Nino T.A. Vanderah C.A. Randall M.T. Lanagan 2002 J. Solid State Chem. 69 168
26. J.C. Tauc, Optical Properties of Solids (North-Holland, Amsterdam, 1972)
27. M. Biegalski, R. Thayer, J. Nino, S. Trolier-Mckinstry, in Proc. 13th IEEE Int. Symp. Appl. Ferroelectrics, vol. 7 (2002), p. 10
28. J.G. Cheng J. Wang T. Dechakupt S. Trolier-Mckinstry 2005 Appl. Phys. Lett. 87 232905