Effect of process parameters and post deposition annealing on the optical, structural and microwave dielectric properties of RF magnetron sputtered (Ba0.5,Sr0.5)TiO3 thin films

Vacuum

Volumn 81, Issue 3, 2006, Pages 307-316

  Venkata Saravanan, K ^a   Sudheendran, K ^a   Ghanashyam Krishna, M ^a   James Raju, K C ^a   Bhatnagar, Anil K ^b  

^a UNIVERSITY OF HYDERABAD   (India)

^b PONDICHERRY UNIVERSITY   (India)

Author keywords

Barium strontium titanate thin films; Microwave dielectric properties; RF magnetron sputtering

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; DIELECTRIC PROPERTIES; MICROWAVES; OPTICAL PROPERTIES; OSCILLATORS (ELECTRONIC); PEROVSKITE; QUARTZ; THIN FILMS;

BARIUM STRONTIUM TITANATE THIN FILMS; MICROWAVE DIELECTRIC PROPERTIES; RF MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 33749137519     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.05.002     Document Type: Article

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