Variable optical absorption edge in ion beam sputtered thin ytterbium oxide films

Thin Solid Films

Volumn 357, Issue 2, 1999, Pages 218-222

  Ghanashyam Krishna, M ^a   Pillier, J S ^a   Bhattacharya, A K ^a  

^a UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; ELECTROMAGNETIC DISPERSION; LIGHT ABSORPTION; LIGHT REFLECTION; LIGHT TRANSMISSION; REFRACTIVE INDEX; SILICA; SPUTTERING; SUBSTRATES; THIN FILMS; YTTERBIUM COMPOUNDS;

ION BEAM SPUTTERING;

OPTICAL FILMS;

EID: 0009470846     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00655-0     Document Type: Article

References (16)

1. Hong S.J., Mehta K., Virkar A.V. J. Electrochem. Soc. 145:1998;638.
2. Galvita V.V., Belyaev V.D., Demin A.K., Sobyanin V.A. Appl. Cat. A. 165:1997;301.
3. Park H., Kim H.E., Niihara K. J. Am. Ceram. Soc. 80:1997;750.
4. Nelson R.E. Conf. Proceedings. 321:1994;80.
5. Capmany J., Bermudez V., Dieguez G. Appl. Phys. Lett. 74:1999;1534.
6. Truszkowska K., Marcinow T., Wesolowska C. Opt. Appl. 4:1974;17.
7. Marcinow T., Wesolowska C., Wiktorczyk T. Opt. Appl. 7:1977;135.
8. Idczak E., Oleszkiewicz E., Zukowska K. Opt. Appl. 9:1979;151.
9. Wiktorczyk T., Wesolowska C. Thin Solid Films. 71:1980;15.
10. Dutta C.R., Barua K. Thin Solid Films. 92:1982;281.
11. Ghanashyam M. Krishna. Y. Debauge, A.K. Bhattacharya, Thin Solid Films. 312:1998;116.
12. Ghanashyam M. Krishna. A.K. Bhattacharya, Mater. Sci. Eng. B. 49:1998;166.
13. Ghanashyam M. Krishna. A.K. Bhattacharya, Int. J. Mod. Phys. B. 13:1999;411.
14. O.S. Heavens, in: Optical Properties of Thin Solid Films, Dover, New York, 1965.
15. Wemple S.H., Didomenico M. Phys. Rev. B. 3:1971;1338.
16. Weller H. Angew. Chem. Int. Ed. Engl. 32:1993;41.