Experimental study of macropore formation in p-type silicon in a fluoride solution and the transition between macropore formation and electropolishing

Electrochimica Acta

Volumn 54, Issue 11, 2009, Pages 3139-3144

  Slimani, A ^a,c   Iratni, A ^a   Chazalviel, J N ^b   Gabouze, N ^c   Ozanam, F ^b  

^a UNIVERSITY OF BOUMERDES   (Algeria)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^c L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

Electrochemical etching; Pore morphology; Porous silicon

Indexed keywords

CRYSTAL ORIENTATION; DISSOLUTION; ELECTROLYTIC POLISHING; HYDROFLUORIC ACID; MORPHOLOGY; POROUS SILICON; SINGLE CRYSTALS;

ALKALINE SOLUTIONS; ANODIC DISSOLUTIONS; ANODIZATION; APPLIED POTENTIALS; CHEMICAL ETCHINGS; CRYSTALLOGRAPHIC ORIENTATIONS; DIRECT MEASUREMENTS; ELECTRO-POLISHING; ETCH DEPTHS; ETCHING ANISOTROPIES; ETCHING CHARACTERISTICS; ETCHING TIME; EXPERIMENTAL STUDIES; FLUORIDE SOLUTIONS; FRACTAL-LIKE STRUCTURES; MACROPORE FORMATIONS; P-TYPE SILICONS; PHYSICO-CHEMICAL PARAMETERS; PORE FORMATIONS; PORE MORPHOLOGY; POROUS SILICON FORMATIONS; SEM OBSERVATIONS; SQUARE SHAPES; TRANSITION REGIONS;

ELECTROCHEMICAL ETCHING;

EID: 62249146876     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.11.052     Document Type: Article

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