Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation

Optics Letters

Volumn 34, Issue 5, 2009, Pages 659-661

  Teo, E J ^a   Bettiol, A A ^a   Yang, P ^b   Breese, M B H ^a   Xiong, B Q ^a   Mashanovich, G Z ^b   Headley, W R ^b   Reed, G T ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

IRRADIATION; OPTICAL WAVEGUIDES; PROTON BEAMS; SILICON; WAVEGUIDES;

FOCUSED PROTON BEAM IRRADIATION; HIGH INDEX CONTRAST; OPTICAL CHARACTERIZATION; OXIDIZED POROUS SILICON; POST-OXIDATION; SILICON BASED OPTOELECTRONICS; STRIP WAVEGUIDES; TM POLARIZATION;

POROUS SILICON;

EID: 61549123571     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.34.000659     Document Type: Article

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