Three-dimensional control of optical waveguide fabrication in silicon

Optics Express

Volumn 16, Issue 2, 2008, Pages 573-578

  Teo, Ee Jin ^a   Bettiol, Andrew A ^a   Breese, Mark B H ^a   Yang, Pengyuan ^b   Mashanovich, Goran Z ^b   Headley, William R ^b   Reed, Graham T ^b   Blackwood, Daniel J ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; FOCUSED ION BEAMS; IRRADIATION; LASER CLADDING; LIGHT POLARIZATION; POROUS SILICON;

DIRECT-WRITE TECHNIQUE; PROPAGATION LOSSES; THREE-DIMENSIONAL CONTROL;

OPTICAL WAVEGUIDES;

NANOMATERIAL; PROTON; SILICON;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; FIBER OPTICS; INSTRUMENTATION; MATERIALS TESTING; METHODOLOGY; POROSITY; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; FIBER OPTICS; MATERIALS TESTING; NANOSTRUCTURES; POROSITY; PROTONS; SILICON; SURFACE PROPERTIES;

EID: 38549097093     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.000573     Document Type: Article

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