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Volumn 27, Issue 2, 2009, Pages 336-341
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Optimal design of antireflection coating and experimental verification by plasma enhanced chemical vapor deposition in small displays
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Author keywords
[No Author keywords available]
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Indexed keywords
ANTIREFLECTION COATINGS;
ELECTRIC IMPEDANCE;
FILM PREPARATION;
LIGHT SOURCES;
LIQUID CRYSTAL DISPLAYS;
LIQUID CRYSTALS;
MULTILAYERS;
OPTICAL CONSTANTS;
OPTIMAL SYSTEMS;
OPTIMIZATION;
PLASMA DEPOSITION;
PLASMAS;
REFRACTIVE INDEX;
SEMICONDUCTING SILICON COMPOUNDS;
SILANES;
THIN FILM DEVICES;
VAPORS;
ADMITTANCE LOCUS;
EXPERIMENTAL VERIFICATIONS;
MATERIAL SELECTIONS;
OPTIMAL DESIGNS;
QUARTER WAVELENGTHS;
SILICON SUBSTRATES;
SMALL DISPLAYS;
THIN-FILM;
THREE LAYERS;
TOTAL REFLECTIONS;
TWO LAYERS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
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EID: 61449096620
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.3081962 Document Type: Article |
Times cited : (20)
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References (20)
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