Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 59-62

  Cheng, W C ^a   Lai, F D ^b   Huang, H M ^b   Wang, Lon A ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b TATUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; CYCLOTRON RESONANCE; EXCIMER LASERS; MATRIX ALGEBRA; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBLEM SOLVING; REFLECTION; REFLECTIVE COATINGS; SILICON; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION;

BOTTOM ANTIREFLECTIVE COATING (BARC); FLOW RATES; HEXAMETHYLDISILOXANE (HMDSO); TUNABILITY;

PHOTOLITHOGRAPHY;

EID: 18544403363     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00073-5     Document Type: Conference Paper

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