InAs(100) surfaces cleaning by an As-Free low-temperature 100°C treatment

Journal of the Electrochemical Society

Volumn 156, Issue 4, 2009, Pages

  Losurdo, Maria ^a   Giangregorio, Maria M ^a   Lisco, Fabiana ^a   Capezzuto, Pio ^a   Bruno, Giovanni ^a   Wolter, Scott D ^b   Angelo, Michael ^b   Brown, April ^b  

^a CNR   (Italy)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; INDIUM ARSENIDE; METHANOL; SEMICONDUCTING INDIUM; SPECTROSCOPIC ELLIPSOMETRY;

ATOMIC HYDROGEN TREATMENTS; EFFECTIVE OXIDE THICKNESS; INAS; LOW TEMPERATURES; NANO-METER SCALE; OXIDE REMOVALS;

SURFACE TREATMENT;

EID: 61349185749     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3076194     Document Type: Article

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