Age-based double EWMA controller and its application to CMP processes

IEEE Transactions on Semiconductor Manufacturing

Volumn 14, Issue 1, 2001, Pages 11-19

  Chen, Argon ^b,c   Guo, Ruey Shan ^a,b,c  

^a IEEE   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

CMP process; EWMA; Run by run control

Indexed keywords

EXPONENTIALLY WEIGHTED MOVING AVERAGE; PREDICTOR CORRECTOR CONTROL; SEMICONDUCTOR INDUSTRY;

CONTROL SYSTEM SYNTHESIS; ELECTRONICS INDUSTRY; ESTIMATION; PREDICTIVE CONTROL SYSTEMS; STATISTICAL PROCESS CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035248689     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.909650     Document Type: Article

References (11)

1. Run by run process control: Combining SPC and feedback control
2. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry
3. Run by run advanced process control of metal sputter deposition
4. Run by run control of chemical-mechanical polishing
5. A self-tuning EWMA controller utilizing artificial neural network function approximation techniques
6. Run-to-run process control: Literature review and extensions
7. PID run to run control of CMP removal rate