A comparison of run-to-run control algorithms

Proceedings of the American Control Conference

Volumn 3, Issue , 2002, Pages 2150-2155

  Campbell, W Jarrett ^a,b   Firth, Stacy K ^a   Toprac, Anthony J ^a   Edgar, Thomas F ^b  

^a Yield Dynamics Inc   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; MATHEMATICAL MODELS; PREDICTIVE CONTROL SYSTEMS; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR DEVICE MANUFACTURE;

BATCH PROCESS CONTROL; MODEL PREDICTIVE CONTROL; RUN-TO-RUN CONTROL;

PROCESS CONTROL;

EID: 0036349477     PISSN: 07431619     EISSN: None     Source Type: Journal    
DOI: 10.1109/ACC.2002.1023955     Document Type: Article

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