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Volumn 48, Issue 2, 2009, Pages
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Surface cleaning of gold structure by annealing during fabrication of microelectromechanical system devices
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITE MICROMECHANICS;
ELECTROCHEMISTRY;
GOLD;
GOLD METALLURGY;
MECHATRONICS;
MEMS;
MICROELECTROMECHANICAL DEVICES;
OXYGEN;
SURFACE ANALYSIS;
SURFACE STRUCTURE;
X RAY PHOTOELECTRON SPECTROSCOPY;
DRY PROCESS;
GOLD OXIDES;
GOLD STRUCTURES;
GOLD SURFACES;
INCUBATION PERIODS;
MICRO-ELECTRO MECHANICAL SYSTEMS;
NON-UNIFORM THICKNESS;
ORGANIC CONTAMINANTS;
OXIDIZED SURFACES;
OXYGEN PLASMAS;
X-RAY PHOTOELECTRON SPECTROSCOPIES;
SURFACE CLEANING;
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EID: 60849136329
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.026501 Document Type: Article |
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Times cited : (15)
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References (12)
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