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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4230, Issue , 2000, Pages 43-52

Microfabrication technology for high-speed Si-based systems

(9) Ishii, H a Yagi, S a Saito, K a Hirata, A a Kudo, K a Yano, M a Nagatsuma, T a Machida, K a Kyuragi, H a

a NTT CORPORATION (Japan)

Author keywords

Antenna; CMP; CPW; Inductor; Millimeter wave; Passive device; Plating; RF; Si; Transmission line; ULSI

Indexed keywords

ELECTRIC LINES; ELECTROLESS PLATING; MICROWAVE DEVICES; MULTICHIP MODULES; POLYIMIDES; Q FACTOR MEASUREMENT; WAVEGUIDES;

CHEMICAL MECHANICAL PLANARIZATION (CMP);

SEMICONDUCTING SILICON;

EID: 0034454811 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.404913 Document Type: Conference Paper

Times cited : (25)

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