|
Volumn 39, Issue 4 B, 2000, Pages 1982-1986
|
A new fabrication process for low-loss millimeter-wave transmission lines on silicon
|
Author keywords
CPW; EOS; Millimeter wave; Silicon; Transmission; ULSI; Waveguide
|
Indexed keywords
ATTENUATION;
CHEMICAL POLISHING;
DIELECTRIC LOSSES;
ELECTROMAGNETIC WAVE TRANSMISSION;
ELECTRONIC EQUIPMENT MANUFACTURE;
ELECTROOPTICAL EFFECTS;
ELECTROPLATING;
PERMITTIVITY;
SEMICONDUCTING SILICON;
SUBSTRATES;
ULSI CIRCUITS;
CHEMICAL MECHANICAL POLISHING;
MILLIMETER WAVE SYSTEMS;
MILLIMETER WAVE TRANSMISSION LINES;
SELECTIVE ELECTROPLATING;
SILICON TECHNOLOGY;
WAVEGUIDES;
|
EID: 0033687723
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.1982 Document Type: Article |
Times cited : (20)
|
References (14)
|