Modeling and experimental analysis in excimer-laser crystallization of a-Si films

Journal of Crystal Growth

Volumn 303, Issue 1 SPEC. ISS., 2007, Pages 199-202

  Chen, Yu Ru ^a   Chang, Chien Hung ^a   Chao, Long Sun ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

A1. Crystal structure; A1. Excimer laser crystallization; A1. Heat transfer; A1. SiO2 buffer layer; A1. Soldification; B1. Poly Si film

Indexed keywords

AMORPHOUS SILICON; CRYSTAL STRUCTURE; CRYSTALLIZATION; EXCIMER LASERS; HEAT TRANSFER; LASER HEATING; MATHEMATICAL MODELS; MICROSTRUCTURE; SILICA; SOLIDIFICATION;

BUFFER LAYER; CRITICAL FLUENCES; LASER INTENSITY; PARTIAL-MELTING;

AMORPHOUS FILMS;

EID: 34047251814     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.11.300     Document Type: Article

References (11)

1. Brotherton S.D., Mcculloch D.J., Gowers J.P., Ayres J.R., and Trainor M.J. J. Appl. Phys. 82 (1997) 4086
2. Bergmann R.B., Kohler J., Dassow R., Zaczek. C., and Werner J.H. Phys. Stat. Sol. (a) 166 (1998) 587
3. Chen Y.R., and Chao L.S. Mater. Sci. Forum 505-507 (2006) 277
4. Kuriyama H., Kiyama S., Noguchi S., Kuwahara T., Ishida S., Nohda T., Sano K., Kawata H., Osumi M., Tsuda S., Nakano S., and Kuwano Y. Jpn. J. Appl. Phys. 30 (1991) 3700
5. Grigoropoulos C.P., Moon S., Lee M., Hatano M., and Suzuki K. Appl. Phys. A 69 (1999) 295
6. Hatano M., Moon S., and Lee M. J. Appl. Phys. 87 (2000) 36
7. Yilbas B.S. Int. J. Heat Mass Transfer 40 (1997) 1131
8. Dantzig J.A. Int. J. Numer. Methods Eng. 28 (1989) 1769
9. Chang C.H., and Chao L.S. Mater. Sci. Forum 505-507 (2006) 283
10. Modest M.F. Radiative Heat Transfer (1993), McGraw-Hill Book Company, New York
11. Im J.S., Kim H.J., and Thompson M.O. Appl. Phys. Lett. 63 (1993) 1969