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Volumn 13, Issue 3, 2002, Pages 290-293
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Low-pressure chemical vapour deposition of nanograin polysilicon ultra-thin films
a
a
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
GRAIN SIZE AND SHAPE;
NUCLEATION;
POLYSILICON;
SILANES;
ULTRATHIN FILMS;
NANOGRAINS;
NANOTECHNOLOGY;
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EID: 0036608332
PISSN: 09574484
EISSN: None
Source Type: Journal
DOI: 10.1088/0957-4484/13/3/310 Document Type: Conference Paper |
Times cited : (19)
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References (17)
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