Low-pressure chemical vapour deposition of nanograin polysilicon ultra-thin films

Nanotechnology

Volumn 13, Issue 3, 2002, Pages 290-293

  Ecoffey, Serge ^a   Bouvet, Didier ^a   Ionescu, Adrian M ^a   Fazan, Pierre ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; NUCLEATION; POLYSILICON; SILANES; ULTRATHIN FILMS;

NANOGRAINS;

NANOTECHNOLOGY;

EID: 0036608332     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/13/3/310     Document Type: Conference Paper

References (17)