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Volumn 94, Issue 4, 2009, Pages 949-955
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Nanosecond pulsed laser ablation of silicon in liquids
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Author keywords
[No Author keywords available]
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Indexed keywords
ABLATION;
CHEMICAL MODIFICATION;
DIMETHYL SULFOXIDE;
ELECTRIC NETWORK ANALYSIS;
GROWTH (MATERIALS);
IRRADIATION;
LASER ABLATION;
LASER APPLICATIONS;
LASER PULSES;
LASERS;
LIQUIDS;
NONMETALS;
PHASE INTERFACES;
PHOTOACOUSTIC EFFECT;
PLASMA CONFINEMENT;
POROUS SILICON;
PULSED LASER DEPOSITION;
SURFACE MORPHOLOGY;
TARGETS;
ULTRASHORT PULSES;
WATER ANALYSIS;
ABLATION THRESHOLDS;
BUBBLE NUCLEATIONS;
CONFINED PLASMAS;
DIAMETER GROWTHS;
DOMINANT PROCESS;
EXPERIMENTAL MEASUREMENTS;
INCUBATION EFFECTS;
IRRADIATED SPOTS;
LASER FLUENCE;
LASER FLUENCES;
LASER SHOTS;
LASER-INDUCED ABLATIONS;
LATERAL INTERACTIONS;
LIQUID INTERFACES;
MELT EXPULSIONS;
NANOSECOND LASER PULSE;
NANOSECOND PULSED LASERS;
PULSE LASERS;
PULSED ENERGIES;
PULSED LASER IRRADIATIONS;
SILICON SURFACE MORPHOLOGIES;
SILICON SURFACES;
SILICON TARGETS;
SINGLE SHOTS;
SOLID TARGETS;
WATER INTERFACES;
PULSED LASER APPLICATIONS;
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EID: 59749105766
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-008-4873-8 Document Type: Article |
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Times cited : (52)
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References (40)
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