Damage threshold dependence on electron-phonon coupling in Au and Ni films

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 40-45

  Gudde J ^a   Hohlfeld, J ^a   Muller J G ^a   Matthias, E ^a  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Electron diffusion length; Film thickness dependence; Laser damage threshold; Metals; Two temperature model

Indexed keywords

ABSORPTION; ELECTRONS; GOLD; LASER BEAM EFFECTS; LASER PULSES; LIGHT SCATTERING; MATHEMATICAL MODELS; NICKEL; PULSED LASER APPLICATIONS; THERMAL DIFFUSION IN SOLIDS; THIN FILMS;

ELECTRON DIFFUSION LENGTH; ELECTRON PHONON COUPLING; FILM THICKNESS DEPENDENCE; LASER DAMAGE THRESHOLD;

SURFACE PROPERTIES;

EID: 0032074153     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00002-6     Document Type: Article

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