Field emission characteristics of nano-sized dot array carbon nano-tube emitters fabricated by direct current plasma chemical vapor deposition

Diamond and Related Materials

Volumn 18, Issue 2-3, 2009, Pages 548-552

  Matsuda, T ^a   Sato, J ^a   Ishikawa, T ^a   Ogino, A ^a   Nagatsu, M ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Carbon nano tubes; Dot array; Field emission; Fowler Nordheim plot; Plasma CVD; Post plasma treatment

Indexed keywords

CARBON NANOTUBES; FIELD EMISSION; NANOTUBES; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA THEORY; PLASMAS; TUBES (COMPONENTS); VAPORS;

AR PLASMA TREATMENTS; CHEMICAL VAPORS; CNT EMITTERS; CNT TIPS; DIRECT CURRENT PLASMAS; DOT ARRAY; FIELD EMISSION PROPERTIES; FIELD-EMISSION CHARACTERISTICS; FOWLER-NORDHEIM PLOT; HIGH FIELDS; IN FIELDS; NANO-SIZED; NON-LINEAR; PLASMA CVD; PLASMA TREATMENTS; POST-PLASMA TREATMENT; TURN-ON VOLTAGES; VERTICALLY ALIGNED;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 59649089244     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.09.005     Document Type: Article

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