Field-emission characteristics of hydrogenated amorphous carbon films prepared by surface wave plasma

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 9 A/B, 2000, Pages

  Nagatsu, Masaaki ^a   Sano, Toru ^a   Takada, Noriharu ^a   Guang, Wang X ^b   Hirao, Takashi ^b   Sugai, Hideo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DIAMOND FILMS; ELECTRIC FIELDS; HYDROGENATION; MICROWAVES; PLASMA WAVES; SILICON; SUBSTRATES; WAVEGUIDES;

FIELD-EMISSION DISPLAYS (FEDS); HYDROGENATED AMORPHOUS CARBON FILMS PREPARED BY SURFACE WAVE PLASMA; SURFACE WAVE PLASMAS;

AMORPHOUS FILMS;

EID: 0034266772     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l929     Document Type: Article

References (28)

1. J. E. Jaskie: Mater. Res. Soc. Bull. 21 (1996) 59.
2. J. Robertson: Diamond Films & Technol. 8 (1998) 225.
3. F. J. Himpsel, J. S. Knapp, J. A. Van Vechten and D. E. Eastman: Phys. Rev. B 20 (1979) 624.
4. M. W. Geis, J. C. Twichell, J. Macaulay and K. Okano: Appl. Phys. Lett. 67 (1995) 1328.
5. A. Lamouri, Y. Wang, G. T. Mearini, I. L. Krainsky, J. A. Dayton, Jr. and W. Mueller: J. Vac. Sci. & Technol. B 14 (1996) 2046.
6. T. Sugino, K. Muriyam, S. Kawasaki, Y. Iwasaki and J. Shirafuji: Jpn. J. Appl. Phys. 37 (1998) L413.
7. T. Hong, S. Chen, Y. Chou and C. Chen: Thin Solid Films 270 (1995) 148.
8. W. Zhu, G. P. Kochanski, S. Jin and L. Seibles: J. Vac. Sci. & Technol. B 14 (1996) 2011.
9. C. F. M. Boeges, M. Moisan and A. Gicquel: Diamond Relat. Mater. 4 (1995) 149.
10. D. Zhou, T. G. McCauley, L. C. Qin, A. R. Krauss and D. M. Gruen: J. Appl. Phys. 83 (1998) 540.
11. D. R. McKenzie, Y. Yin, N. A. Marks, C. A. Davis, E. Kravtchinskaia, B. A. Pailthorpe and G. A. J. Amaratunga: J. Non-Cryst. Solids 164-166(1993) 1101.
12. P. J. Fallon, V. S. Veerasamy, C. A. Davis, J. Robertson, G. A. J. Amaratunga, W. I. Milne and J. Koskinen: Phys. Rev. B 48 (1993) 4777.
13. S. Xu, B. K. Tay, H. S. Tan, L. Zhong, Y. Q. Tu, S. R. P. Silva and W. I. Milne: J. Appl. Phys. 79 (1996) 7234.
14. B. S. Satyanarayana, A. Hart, W. I. Milne and J. Robertson: Appl. Phys. Lett. 71 (1997) 1430.
15. L. K. Cheah, X. Shi, B. K. Tay, S. R. P. Silva and Z. Sun: Diamond Relat. Mater. 7 (1998) 640.
16. A. Hart, B. S. Satyanarayana, W. I. Milne and J. Robertson: Appl. Phys. Lett. 74 (1999) 1594.
17. A. A. Talin, T. E. Felter, T. A. Friedmann, J. P. Sullivan and M. P. Siegal: J. Vac. Sci. & Technol. A 14 (1996) 1719.
18. C. Lin, S. Chang, M. Yokoyama, F. Chuang, C. Tsai, W. Wang and I. Lin: Jpn. J. Appl. Phys. 38 (1999) 890.
19. S. R. P. Silva, K. J. Clay, S. P. Speakman and G. A. J. Amaratunga: Diamond Relat. Mater. 4 (1995) 977.
20. G. A. J. Amaratunga and S. R. P. Silva: Appl. Phys. Lett. 68 (1996) 2529.
21. S. Sattel, J. Robertson and H. Ehrhardt: J. Appl. Phys. 82 (1997) 4566.
22. C. Chen, S. Chen and K. Lin: Thin Solid Films 270 (1995) 205.
23. N. A. Morrison, S. E. Rodil, A. C. Ferrari, J. Robertson and W. I. Milne: Thin Solid Films 337 (1999) 71.
24. I. Brodie and C. A. Spindt: Adv. Electron. Electron Phys. 83 (1992) 1.
25. H. Nakamura, M. Nagahiro, Y. Hayashi and S. Nishino: Proc. 15th Symp. Plasma Processing, ed. S. Miyake (Jpn. Soc. Appl. Phys., Hamamatsu, Japan, 1998) p. 96.
26. M. Moisan, C. F. M. Borges and S. Schelz: Proc. 11th Int. Colloquium Plasma Process (Société Francaise Du Vide, Le Mans, France, 1997) p. 109.
27. M. Nagatsu, T. Sano, N. Takada, N. Toyoda, W. X. Guang, T. Hirao, H.Toyoda and H. Sugai: Abstr. 4th Int. Workshop on Microwave Discharges, Fundamentals & Applications (Moscow, Russia, 2000).
28. A. Hart, B. S. Satyanarayana, W. I. Milne and J. Robertson: Diamond Relat. Mater. 8 (1999) 809.