Resonant Fowler-Nordheim tunneling emission from metal-oxidesemiconductor cathodes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 803-806

  Mimura, H ^a   Abe, Y ^a   Ikeda, J ^b   Tahara, K ^a   Neo, Y ^a   Shimawaki, H ^a   Yokoo, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004753442     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589909     Document Type: Article

References (6)

1. T. Ohshima, M. Okamoto, and K. Kuroda, Jpn. J. Appl. Phys., Part 2 34, L1390 (1995).
2. H. Mimura, M. Hosoda, N. Ohtani, J. Ikeda, Y. Neo, H. Shimawaki, and K. Yokoo, Technical Report of IEICE Japan, ED96-144, 61 (1996).
3. K. Yokoo, H. Tanaka, S. Sato, J. Murota, and S. Ono, J. Vac. Sci. Technol. B 11, 429 (1993).
4. K. Yokoo, S. Sato, G. Koshita, I. Amano, J. Murota, and S. Ono, J. Vac. Sci. Technol. B 12, 801 (1994).
5. K. Yokoo, G. Koshita, S. Hanzawa, Y. Abe, and Y. Neo, J. Vac. Sci. Technol. B 14, 2096 (1996).
6. J. Maserjian and N. Zamani, J. Appl. Phys. 53, 559 (1982).