Atomic-level characterization of materials with core- and valence-level photoemission: Basic phenomena and future directions

Surface and Interface Analysis

Volumn 40, Issue 13, 2008, Pages 1579-1605

  Fadley, Charles S ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Photoelectron spectroscopy; Photoemission; Synchrotron radiation; XPS

Indexed keywords

ATOMIC PHYSICS; ATOMS; CHEMICAL ENGINEERING; ELECTROMAGNETIC WAVES; ELECTRON SPECTROSCOPY; ELECTRONS; EMISSION SPECTROSCOPY; HOLOGRAPHIC INTERFEROMETRY; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; SPECTRUM ANALYSIS; SYNCHROTRON RADIATION; SYNCHROTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LEVELS; CHEMICAL PROCESSING; FUTURE DIRECTIONS; NEW MATERIALS; PHOTOELECTRON DIFFRACTION; WAVE EXCITATIONS; X RAY EXCITATION; XPS;

PHOTOELECTRON SPECTROSCOPY;

EID: 58449126134     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2902     Document Type: Review

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