Scope of VHF plasma deposition for thin-film silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1996, Pages 669-672

  Keppner, H ^a   Kroll, U ^a   Torres, P ^a   Meier, J ^a   Fischer, D ^a   Goetz, M ^a   Tscharner, R ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; GLOW DISCHARGES; HIGH TEMPERATURE PROPERTIES; HYDROGEN; SEMICONDUCTOR PLASMAS; SUBSTRATES; THIN FILMS;

COPPER INDIUM DISELENIDE; THIN FILM SILICON SOLAR CELLS; VERY HIGH FREQUENCY GLOW DISCHARGE PROCESS; VERY HIGH FREQUENCY PLASMA DEPOSITION;

SILICON SOLAR CELLS;

EID: 0030421963     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pvsc.1996.564217     Document Type: Conference Paper

References (17)