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Volumn 79, Issue 11, 1996, Pages 8748-8760

Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900°C

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000593189     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362501     Document Type: Review
Times cited : (47)

References (47)
  • 32
    • 85033007527 scopus 로고    scopus 로고
    • P. J. Zanzucchi, in Ref. 26
    • P. J. Zanzucchi, in Ref. 26.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.