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Volumn 79, Issue 11, 1996, Pages 8748-8760

Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900°C

(4) Brogueira, P a Conde, J P a Arekat, S b Chu, V c

a INSTITUTO SUPERIOR TÉCNICO (Portugal)

b UNIVERSITY OF BAHRAIN (Bahrain)

c INESC (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000593189 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.362501 Document Type: Review

Times cited : (47)

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