Characteristics of zinc-oxide-sulfide-mixed films deposited by using atomic layer deposition

Journal of the Korean Physical Society

Volumn 53, Issue 6, 2008, Pages 3287-3295

  Jeon, Sunyeol ^a   Bang, Seokhwan ^a   Lee, Seungjun ^a   Kwon, Semyung ^a   Jeong, Wooho ^a   Jeon, Hyeongtag ^a   Chang, Ho Jung ^b   Park, Hyung Ho ^c  

^a Hanyang University   (South Korea)

^b Dankook University   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

ALD; Carrier concentration; ZnO; ZnS

Indexed keywords

EID: 58249118694     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.53.3287     Document Type: Article

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