Self-masked high-aspect-ratio polymer nanopillars

Nanotechnology

Volumn 19, Issue 50, 2008, Pages

  Chen, Ming Hung ^a   Chuang, Yun Ju ^a   Tseng, Fan Gang ^a,b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMECHANICAL DEVICES; ETCHING; MICROCHANNELS; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; POLYMERIC GLASS; POLYMERS; REACTIVE ION ETCHING; SILICONES; SURFACE ANALYSIS;

COVER GLASSES; DIMETHYLSILOXANE; ELECTROMECHANICAL SYSTEMS; ETCHING TIMES; LAB ON A CHIPS; MATERIAL CONFIGURATIONS; NANO MASKS; NANO PILLARS; NANOSTRUCTURED; PARYLENE; PHOTOELECTRON MICROSCOPIES; REACTIVE IONS; STRUCTURAL ASPECTS; UNIVERSAL METHODS;

ASPECT RATIO;

GLASS; ION; NANOMATERIAL; POLYMER;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; MASKING; NANOFABRICATION; PRIORITY JOURNAL; SURFACE PROPERTY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58149263206     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/50/505301     Document Type: Article

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