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Volumn 86, Issue 2, 2007, Pages 193-196

Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; MATERIALS SCIENCE; OPTIMIZATION; REACTIVE ION ETCHING;

EID: 33845291168     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-006-3748-0     Document Type: Article
Times cited : (40)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.