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Volumn 86, Issue 2, 2007, Pages 193-196
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Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique
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Author keywords
[No Author keywords available]
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Indexed keywords
ANISOTROPY;
ASPECT RATIO;
MATERIALS SCIENCE;
OPTIMIZATION;
REACTIVE ION ETCHING;
ETCHING ANISOTROPY;
GAS MIXTURE;
SILICON PILLARS;
NANOSTRUCTURED MATERIALS;
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EID: 33845291168
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-006-3748-0 Document Type: Article |
Times cited : (40)
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References (16)
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