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Volumn 6152 I, Issue , 2006, Pages

Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment

Author keywords

[No Author keywords available]

Indexed keywords

CONDITION MONITORING; DYNAMIC RANDOM ACCESS STORAGE; FILE EDITORS; MEASUREMENT THEORY; PATTERN RECOGNITION; PRODUCT DEVELOPMENT; SCANNING ELECTRON MICROSCOPY; VIRTUAL REALITY;

EID: 33745611747     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654787     Document Type: Conference Paper
Times cited : (7)

References (6)
  • 2
    • 24644448785 scopus 로고    scopus 로고
    • Use of design pattern layout for automated metrology recipe generation
    • Use of Design Pattern Layout for Automated Metrology Recipe Generation. C.Tabery, L.Page, SPIE Microlithography Conference 2005, Proc. SPIE 5752, p. 1424, 2005.
    • (2005) SPIE Microlithography Conference 2005, Proc. SPIE , vol.5752 , pp. 1424
    • Tabery, C.1    Page, L.2
  • 3
    • 24644483638 scopus 로고    scopus 로고
    • OPC accuracy enhancement through systematic OPC calibration and verification methodology for sub-100nm node
    • OPC Accuracy Enhancement through Systematic OPC Calibration and Verification Methodology for Sub-100nm Node, H.Yang, J.Choi, B.Cho, B.Cho, D.Yim, J.Kim, SPIE Microlithography Conference 2005, Proc. SPIE 5752, p.720, 2005.
    • (2005) SPIE Microlithography Conference 2005, Proc. SPIE , vol.5752 , pp. 720
    • Yang, H.1    Choi, J.2    Cho, B.3    Cho, B.4    Yim, D.5    Kim, J.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.