Improved profile measurement accuracy via feed-forward spectroscopic ellipsometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Peters, Robert M ^a   Lakkapragada, Suresh ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Critical Dimension (CD); Metrology; Scatterometry; Spectroscopic Ellipsometry

Indexed keywords

CRITICAL DIMENSION (CD); SCATTEROMETRY; SPECTROSCOPIC ELLIPSOMETRY;

ASPECT RATIO; ELLIPSOMETRY; GEOMETRY; INTERFACES (COMPUTER); MEASUREMENTS; OPTICS; PARAMETER ESTIMATION; PHOTORESISTS; SIGNAL TO NOISE RATIO;

PROCESS CONTROL;

EID: 33745611744     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656447     Document Type: Conference Paper

References (4)

1. J. Hodges, Y. Lin, D. Burrows, R. Chiao, R. Peters, S. Rangarajan, K. Bhatia, S. Lakkapragada, "Improved Gate Process Control at the 130nm Node Using Spectroscopic Ellipsometry Based Profile Metrology," Proceedings of SPIE, Volume 5038-22, March 2003.
2. J. Allgair, D. Benoit, M. Drew, R. Hershey, L. Litt, P. Herrera, U. Whitney, M. Guevremont, A. Levy, S. Lakkapragada, "Implementation of Spectroscopic Critical Dimension (SCO™) for Gate CD Control and Stepper Characterization," Proceedings of SPIE, Volume 4344-57, March 2001.
3. H. Tompkins, W. McGahan, Spectroscopic Ellipsometry and Reflectometry, John Wiley & Sons, 1999.
4. R. Peters, R. Chiao, T. Eckert, R. Labra, D. Nappa, S. Tang, J. Washington, "Production Control of Shallow Trench Isolation (STI) at the 130nm Node Using Spectroscopic Ellipsometry Based Profile Metrology", Proceedings of SPIE, Volume 5375-85, March 2004.