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Volumn 6923, Issue , 2008, Pages
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Water developable negative tone single molecule resists: High sensitivity non-chemically amplified resists
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Author keywords
Molecular resist; Non chemically amplified photoresist; Onium salt; Photoacid generator; Single component resist; Single molecule resist; Water development
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Indexed keywords
MOLECULAR RESIST;
NON-CHEMICALLY AMPLIFIED PHOTORESIST;
ONIUM SALT;
PHOTOACID GENERATOR;
SINGLE COMPONENT RESIST;
SINGLE MOLECULE RESIST;
WATER DEVELOPMENT;
DISSOLUTION;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON GUNS;
MOLECULES;
PARTICLE BEAMS;
PHOTORESISTORS;
PHOTORESISTS;
IONIZATION OF LIQUIDS;
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EID: 57349129352
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.773188 Document Type: Conference Paper |
Times cited : (15)
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References (11)
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