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Volumn 6923, Issue , 2008, Pages

Water developable negative tone single molecule resists: High sensitivity non-chemically amplified resists

Author keywords

Molecular resist; Non chemically amplified photoresist; Onium salt; Photoacid generator; Single component resist; Single molecule resist; Water development

Indexed keywords

MOLECULAR RESIST; NON-CHEMICALLY AMPLIFIED PHOTORESIST; ONIUM SALT; PHOTOACID GENERATOR; SINGLE COMPONENT RESIST; SINGLE MOLECULE RESIST; WATER DEVELOPMENT;

EID: 57349129352     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773188     Document Type: Conference Paper
Times cited : (15)

References (11)
  • 9
    • 57349161882 scopus 로고    scopus 로고
    • Lawson, R. A.; Lee, C.T.; Yueh, W.; Tolbert, L.; Henderson, C. L. Proc. SPIE 2008 Paper 6923-21
    • Lawson, R. A.; Lee, C.T.; Yueh, W.; Tolbert, L.; Henderson, C. L. Proc. SPIE 2008 Paper 6923-21


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.