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Volumn 6923, Issue , 2008, Pages
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Development of novel positive-tone resists for EUVL
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Author keywords
Chemical amplified resist; Etch resistance; EUV lithography; Low molecular weight resist
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Indexed keywords
DISSOLUTION;
ELECTRON BEAM LITHOGRAPHY;
EXTREME ULTRAVIOLET LITHOGRAPHY;
MOLECULAR WEIGHT;
PHOTORESISTS;
POLYMERIC GLASS;
POLYMERS;
ROUGHNESS MEASUREMENT;
ULTRAVIOLET DEVICES;
WEIGHING;
A STABLES;
CHAIN ENTANGLEMENTS;
CHEMICAL AMPLIFIED RESIST;
ELEMENTAL COMPOSITIONS;
ETCH RESISTANCE;
ETCH RESISTANCES;
EUV LITHOGRAPHY;
FEATURE DIMENSIONS;
FEATURE SIZES;
HIGH DENSITIES;
IN LINES;
LINEAR POLYMERS;
LOW MOLECULAR WEIGHT RESIST;
MATERIAL PROPERTIES;
MOLECULAR SIZES;
PROCESS TECHNOLOGIES;
PROCESSABILITY;
ROOM TEMPERATURES;
STERICALLY CONGESTED;
SYNTHESIS OF;
AMORPHOUS MATERIALS;
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EID: 57349083163
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.772404 Document Type: Conference Paper |
Times cited : (3)
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References (10)
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