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Volumn 6923, Issue , 2008, Pages

Development of novel positive-tone resists for EUVL

Author keywords

Chemical amplified resist; Etch resistance; EUV lithography; Low molecular weight resist

Indexed keywords

DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; MOLECULAR WEIGHT; PHOTORESISTS; POLYMERIC GLASS; POLYMERS; ROUGHNESS MEASUREMENT; ULTRAVIOLET DEVICES; WEIGHING;

EID: 57349083163     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772404     Document Type: Conference Paper
Times cited : (3)

References (10)
  • 1
    • 57349170643 scopus 로고    scopus 로고
    • H.Kinoshita, K.Kurihara, Y.Ishii and Y.Torii: J.Vac.Sci.Tecnol.B7(1989) 1648
    • H.Kinoshita, K.Kurihara, Y.Ishii and Y.Torii: J.Vac.Sci.Tecnol.B7(1989) 1648
  • 3
    • 0348252166 scopus 로고    scopus 로고
    • J.polym.Sci.,PartA, Polm.Chem
    • H.Ito:J.polym.Sci.,PartA, Polm.Chem. 41(2003)3863
    • (2003) , vol.41 , pp. 3863
    • Ito, H.1
  • 10
    • 33745587281 scopus 로고    scopus 로고
    • H.Oizumi,Y.Tanaka,F.Kumasaka,and I.Nishiyama:Proc.SPIE,6151(2006)61512Q-l
    • H.Oizumi,Y.Tanaka,F.Kumasaka,and I.Nishiyama:Proc.SPIE,6151(2006)61512Q-l


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.