Optical characterization of a hydrogen silsesquioxane lithography process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2290-2294

  Samarelli, A ^a   MacIntyre, D S ^a   Strain, M J ^a   De La Rue, R M ^a   Sorel, M ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

LINE-WIDTHS; LITHOGRAPHY PROCESSES; METROLOGY METHODS; NEGATIVE TONE RESISTS; OPTICAL CHARACTERIZATIONS; OPTICAL LINEWIDTHS; OPTICAL STRUCTURES; RESONANT WAVELENGTHS; RING RESONATORS; SILICON ON INSULATORS; SILSESQUIOXANE; VARIATIONS OF;

CONTROL THEORY; ELECTRON BEAMS; HYDROGEN; LINEWIDTH; OPTICAL RESONATORS; OPTICAL WAVEGUIDES; PLASMA ETCHING; RESONATORS; SILICON; WAVEGUIDES;

ELECTRON BEAM LITHOGRAPHY;

EID: 57249104987     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2998694     Document Type: Article

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