Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Wang, Zhigang ^a   Seet, Kock Khuen ^a   Fukaya, Ritsuo ^a   Kadowaki, Yasuhiro ^a   Arai, Noriaki ^a   Ezumi, Makoto ^a   Satoh, Hidetoshi ^a  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Charge balance; Critical dimension; Long term repeatability; Mask metrology; S 9380M; Ultra violet treatment

Indexed keywords

IMAGE PROCESSING; INNOVATION; OPTIMIZATION;

CHARGE BALANCE; CRITICAL DIMENSION; LONG-TERM REPEATABILITY; MASK METROLOGY; ULTRA-VIOLET TREATMENT;

PHOTOMASKS;

INNOVATION; MASKING; OPTIMIZATION;

EID: 42149185768     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746332     Document Type: Conference Paper

References (0)