Full field imprint masks using variable shape beam pattern generators

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2410-2415

  Selinidis, Kosta ^a   Thompson, Ecron ^a   Schmid, Gerard ^a   Stacey, Nick ^a   Perez, Joseph ^a   Maltabes, John ^a   Sreenivasan, S V ^a   Resnick, Douglas J ^a   Fujii, Akjko ^b   Sakai, Yuko ^b   Sasaki, Shiho ^b   Hayashi, Naoya ^b  

^a MOLECULAR IMPRINTS INC   (United States)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED ILLUMINATIONS; BEAM PATTERNS; COMPETITIVE MANUFACTURING; CRITICAL DIMENSION CONTROLS; DEVICE DESIGNS; FEATURE RESOLUTIONS; FULL FIELDS; HIGH QUALITIES; IMPRINT LITHOGRAPHIES; INFRA STRUCTURES; LOW VISCOSITIES; PATTERN DENSITIES; PHOTOCURABLE; PROJECTION OPTICS; RECENT PROGRESSES; RESIDUAL LAYERS; ROADMAP; SAMSUNG; STEP AND FLASH IMPRINT LITHOGRAPHIES; TECHNICAL CHALLENGES; VARIABLE SHAPES; X TEMPLATES;

FABRICATION; FLASH MEMORY; MONOMERS; NANOTECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 57249104955     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2976573     Document Type: Article

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