The development of full field high resolution imprint templates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Yoshitake, Shusuke ^a   Sunaoshi, Hitoshi ^a   Yasui, Kenichi ^a   Kobayashi, Hideo ^b   Sato, Takashi ^b   Nagarekawa, Osamu ^b   Thompson, Ecron ^c   Schmid, Gerard ^c   Resnick, Douglas J ^c  

^a NUFLARE TECHNOLOGY INC   (Japan)

^b HOYA CORPORATION   (Japan)

^c MOLECULAR IMPRINTS INC   (United States)

Author keywords

Full field; Imprint lithography; Imprint mask; S FIL; Template

Indexed keywords

CHROMIUM; CMOS INTEGRATED CIRCUITS; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; ETCHING; GAUSSIAN BEAMS; IMAGE RESOLUTION; OPTICAL SYSTEMS;

BUFFERED OXIDE ETCH (BOE); GAUSSIAN BEAM PATTERN GENERATORS; IMAGE PLACEMENT CAPABILITY; IMPRINT LITHOGRAPHY;

MASKS;

EID: 42149192783     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747568     Document Type: Conference Paper

References (8)

1. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE, Emerging Lithographic Technologies III, 379 (1999).
2. T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya. J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, J. Vac. Sei. Technol. B 18(6), 3572 (2000).
3. G. M. Schmid, E. Thompson, N. Stacey, D. J. Resnick, D. L. Olynick, E, H. Anderson, Microelectronic Engineering, Vol. 84, May-Aug 2007, 853-859.
4. G. M. Schmid, E. Thompson, N. Stacey, D. J. Resnick, D. L. Olynick, E. H. Anderson, Proc. SPIE, 6517, (2007).
5. J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. Wake, Y. Sakai, S. Sakamoto, S. Hara, H. Higurashi, K. Hattori, K. Saito, R. Kendall, S. Tamamushi, Proc. SPIE Vol. 6607, (2007)
6. H. Kobayashi, T. Sato, T. Kagatsume, presented at SPIE, Conference 6517, 2007.
7. L. Jeff Myron, E. Thompson, I. McMackin, D. J. Resnick, T. Kitamura, T. Hasebe, S. Nakazawa, T. Tokumoto, E. Ainley, K. Nordquist, and W. J. Dauksher, Proc. SPIE 6151, (2006).
8. McMackin, J. Choi, P. Schumaker, V. Nguyen, F. Xu, E. Thompson, D. Babbs, S. V. Sreenivasan, M. Watts, and N. Schumaker, Proc. SPIE 5374, 222 (2004).